Applied Materials (AMAT) VeritySEM Automated CD Metrology System
$9,999,999.00
Wafer Specification:
- Wafer Size 200MM
- Wafer Shape SNNF (Semi Notch No Flat)
- Wafer Cassette 12” PP Miraial
- SMIF Interface No
- Electron Gun Schottky Emission Source (fei)
- Accelerating Voltage 300V to 2000V
- Probe Current Low 5pA / Medium 10pA / High 20pA
- Electromagnetic Lens 3 Stage Electromagnetic Lens
- System with Boosting Voltage Beam Deflector Module
- Scan Coil 2-Stage Electromagnetic Deflection (X- and Y-Axes)
- Magnification 1,000x to 400,000x (100um to 0.25um FOV)
- Wafer Imaging Ability Entire Surface of 12” Wafer
- Aspect Ratio >20 : 1
- Resolution 2nm (500V)
- Camera Monochrome, using CCD camera
- Magnification 16x / 220x (450um / 6000um FOV)
- Wafer imaging ability Entire surface of 12” wafer
- Model SGI Fuel
- Automated Image Archiving Function Always / Online Setup / Never
- Measurement Function Average/Maximum/Minimum/Contact Hole/Line Edge Analysis/CH Analysis/Slope
- Measurement Algorithm Normal / Foot / Threshold
- Wafer Stage Anorad XY and Z Stage
- Moving Speed 300mm/sec
- Function Target Faraday Cup / Resolution Target
- Wafer Shape Ability Notch / Orientation Flat
- Pre-alignment Sensing by CCD BAR (200/300mm wafer)
- External Power Distribution Unit
- Fun Filter Unit