Designed for both Defect Detection and Patterned Wafer Review, COMPASS/ComPLUS combines high sensitivity with superior imaging performance for comprehensive inspection across complex semiconductor layers and materials.

KEY FEATURES:

• High-Sensitivity Detection: Identifies patterned wafer defects down to 70 nm and smaller (*on reference structures; recipe- and layer-dependent), with outstanding precision and repeatability.
• Patterned Wafer Review: Enables detailed visualization and rootcause analysis.
• Flexible Operation: Supports multiple wafer types and configurations for R&D and HVM environments.
• Integrated Performance: Works seamlessly with GTI metrology and defect review systems for full process control.

The ComPLUS System is an advanced optical inspection tool optimized for production-grade wafer defect detection. Using darkfield illumination and intelligent image analysis, it ensures precise, reliable inspection of patterned wafers.

KEY FEATURES & SPECIFICATIONS:

• High-Sensitivity Defect Detection: Flexible illumination (darkfield / brightfield) with refined optics to capture yield-critical defects.
• Real-Time, In-Line Process Monitoring:Integrates seamlessly into production for automated inspection and feedback.
• Advanced Illumination & Multi-Angle Detection: Configurable lighting and detection modes enhance defect visibility.
• Wafer Size Compatibility: Supports 150mm, 200mm, and 300mm (12″) wafers.
• Sub-Micron Precision & High Resolution: Up to 100× magnification and ~0.05 μm repeatability (depending on configuration).
• Application Versatility:Suitable for both mask and wafer inspections (darkfield wafer inspection version).

• High-Sensitivity Detection
• Patterned Wafer Review
• Flexible Operation
• Intergrated Performance